发明名称 |
SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD |
摘要 |
Provided is a semiconductor device having a highly reliable through via hole. This semiconductor device has: a semiconductor substrate; first wiring formed in a first wiring layer on the semiconductor substrate; a through via hole, which is penetrating the semiconductor substrate, and is connected to the first wiring; and a first insulating film positioned at an area corresponding to an inter-wiring space of the first wiring, said area being at the interface between the through via hole and the first wiring layer. |
申请公布号 |
WO2017038108(A1) |
申请公布日期 |
2017.03.09 |
申请号 |
WO2016JP53635 |
申请日期 |
2016.02.08 |
申请人 |
SOCIONEXT INC. |
发明人 |
OHIRA, Hikaru;OCHIMIZU, Hirosato;OWADA, Tamotsu |
分类号 |
H01L21/3205;H01L21/768;H01L23/522 |
主分类号 |
H01L21/3205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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