发明名称 |
SPACER LAYER FOR MAGNETORESISTIVE MEMORY |
摘要 |
A bottom pinned perpendicular magnetic tunnel junction (pMTJ) with high TMR which can withstand high temperature back-end-of-line (BEOL) processing is disclosed. The pMTJ includes a composite spacer layer between a SAF layer and a reference layer of the fixed magnetic layer of the pMTJ. The composite spacer layer includes a first non-magnetic (NM) spacer layer, a magnetic (M) spacer layer disposed over the first NM spacer layer and a second NM spacer layer disposed over the M layer. The M layer is a magnetically continuous amorphous layer, which provides a good template for the reference layer. |
申请公布号 |
US2017125664(A1) |
申请公布日期 |
2017.05.04 |
申请号 |
US201615339928 |
申请日期 |
2016.10.31 |
申请人 |
GLOBALFOUNDRIES Singapore Pte. Ltd. |
发明人 |
TAHMASEBI Taiebeh;NAIK Vinayak Bharat;LEE Kangho;SEET Chim Seng;YAMANE Kazutaka |
分类号 |
H01L43/02;H01L27/22;H01L43/12;H01L43/08;H01L43/10 |
主分类号 |
H01L43/02 |
代理机构 |
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代理人 |
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主权项 |
1. A method of forming a device comprising:
providing a substrate comprising circuit component formed on a substrate surface; performing back-end-of-line (BEOL) processing to form level dielectric (ILD) layer over the substrate, wherein the ILD layer comprises a plurality of ILD levels; and forming a magnetic tunneling junction (MTJ) stack in between adjacent ILD levels of the upper ILD layer, wherein the MTJ stack comprises
a magnetic fixed layer, the magnetic fixed layer comprises
a synthetic antiferromagnetic (SAF) layer,a composite spacer layer disposed on the SAF layer, the composite spacer layer comprises
a first non-magnetic (NM) spacer layer,a magnetic (M) spacer layer disposed over the first NM spacer layer, anda second NM spacer layer disposed over the M layer, anda reference layer disposed over the composite spacer layer,a tunneling barrier layer disposed over the magnetic fixed layer, anda magnetic free layer disposed over the tunneling barrier layer. |
地址 |
Singapore SG |