| 摘要 |
PURPOSE:To form a Co-Cr alloy vertically magnetized film having continuously constant magnetic characteristics onto the surface of a substrate by spectrally diffracting plasma generated between a Co-Cr alloy target and the substrate and controlling the intensity ratio of both spectra so as to reach a fixed value during sputtering. CONSTITUTION:A magnetron sputtering device is used, sputtering is started under the conditions of the quality of a material of a base body of polyethylene terephthalate, the quality of materials of a target of Co-18wt% Cr, Ar partial pressure of 2X10<-3>Torr in a sputtering atmosphere, sputtering currents of 2A, the magnetic flux density of 350 Gauss of the target and the currents of 15A of a coil for a magnetic field, and a section between the target and a substrate is diffracted spectrally by plasma at every two hr. The intensity ratio of a Co spectrum to an Ar spectrum is read on the basis of the result of the spectral diffraction, the magnetic flux density of the target is adjusted by changing the currents of the coil for the magnetic field so that the intensity ratio reaches a predetermined value 5, and the magnetic flux density of the target is adjusted during sputtering for one hundred hr. Accordingly, a Co-Cr alloy vertically magnetized film having constant magnetic characteristics can be shaped onto the surface of the substrate.
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