发明名称 Imprint apparatus and article manufacturing method
摘要 An imprint apparatus of the present invention that molds and cures an imprint material on a substrate using a mold to form a pattern on the substrate. The imprint apparatus includes a supply unit configured to supply a gas into a gap between the imprint material on the substrate and the mold. The supply unit is configured to supply a mixed gas in which a permeable gas, which permeates at least one of the mold, the imprint material and the substrate, and a condensable gas, which is liquefied under a pressure generated by the molding, is mixed with each other.
申请公布号 US9636851(B2) 申请公布日期 2017.05.02
申请号 US201414171909 申请日期 2014.02.04
申请人 CANON KABUSHIKI KAISHA 发明人 Tanabe Masayuki;Tamura Yasuyuki;Hanyu Yukio
分类号 B29C59/00;B29C43/56;B82Y10/00;B82Y40/00;G03F7/00;B29C33/00;B29C43/02;B29C59/16;B29C59/02;B29K101/00;B29L31/34 主分类号 B29C59/00
代理机构 Rossi, Kimms & McDowell LLP 代理人 Rossi, Kimms & McDowell LLP
主权项 1. An imprint apparatus that performs pressing of a mold against an imprint material on a substrate to form a pattern on the substrate, the imprint apparatus comprising: a supply unit configured to: supply, between the imprint material on the substrate and the mold, permeable gas that includes helium or hydrogen or both thereof and has a property of permeating the mold, the imprint material, or the substrate, or any two thereof or all thereof, and condensable gas that includes hydrofluorocarbon or hydrofluoroether or both thereof and has a property of being liquefied under a pressure generated by the pressing; andadjust a component ratio of the permeable gas and the condensable gas so that an effect thereof on formation of the pattern falls within an allowable range, wherein the imprint apparatus is configured to perform the pressing in a state where the permeable gas and the condensable gas, with the component ratio thereof adjusted, are supplied between the imprint material on the substrate and the mold.
地址 Tokyo JP