发明名称 ANTENNA SYSTEM WITH FULL METAL BACK COVER
摘要 An antenna system with a full metal back cover is provided in the present disclosure. The antenna system includes a metal back cover with a main body, a first sidewall and a second sidewall opposite to each other, a circuit board with a main ground point, a first antenna module and a second antenna module electrically connected to the circuit board. A first gap is formed between the first sidewall and the main body, and a second gap is formed between the second sidewall and the main body; the metal back cover is divided into a first metal portion including the first sidewall and a second metal portion including the second sidewall. The first metal portion includes a top slit penetrating through an edge of the first sidewall, and the second metal portion includes a bottom slit penetrating through an edge of the second sidewall.
申请公布号 US2017117614(A1) 申请公布日期 2017.04.27
申请号 US201615283530 申请日期 2016.10.03
申请人 Wu Jing;Mai Jianchun;Wang Chao 发明人 Wu Jing;Mai Jianchun;Wang Chao
分类号 H01Q1/24;H01Q1/38;H01Q1/48;H01Q1/22;H01Q1/36 主分类号 H01Q1/24
代理机构 代理人
主权项 1. An antenna system, comprising: a metal back cover comprising a main body and a plurality of sidewalls extending from the main body, the plurality of sidewalls comprising a first sidewall and a second sidewall opposite to each other; a circuit board with a main ground point; a first antenna module and a second antenna module electrically connected to the circuit board; wherein a first gap is formed between the first sidewall and the main body, and a second gap is formed between the second sidewall and the main body; the metal back cover is divided into a first metal portion including the first sidewall, a second metal portion including the second sidewall, and a third metal portion between the first metal portion and the second metal portion, which are insulated from each other; wherein the first metal portion comprises a top slit penetrating through an edge of the first sidewall and the first gap, and the second metal portion comprises at least one bottom slit penetrating through an edge of the second sidewall and the second gap.
地址 Shenzhen CN