| 发明名称 | Lithographic apparatus and method | ||
| 摘要 | A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area. | ||
| 申请公布号 | US9632435(B2) | 申请公布日期 | 2017.04.25 |
| 申请号 | US201113046211 | 申请日期 | 2011.03.11 |
| 申请人 | ASML NETHERLANDS B.V. | 发明人 | Ten Kate Nicolaas;Jacobs Johannes Henricus Wilhelmus;Ottens Joost Jeroen;Knarren Bastiaan Andreas Wilhelmus Hubertus;Laurent Thibault Simon Mathieu;Voogd Robbert Jan;Nino Giovanni Francisco;Kunnen Johan Gertrudis Cornelis;Remie Marinus Jan |
| 分类号 | G03B27/52;G03B27/58;G03F7/20 | 主分类号 | G03B27/52 |
| 代理机构 | Pillsbury Winthrop Shaw Pittman LLP | 代理人 | Pillsbury Winthrop Shaw Pittman LLP |
| 主权项 | 1. A lithographic projection apparatus comprising: a substrate table configured to support a substrate on a substrate supporting area, the substrate table comprising a plurality of heaters and/or temperature sensors adjacent a central portion of the substrate supporting area, the plurality of heaters and/or sensors being elongate, and heater elements configured to receive electricity of the plurality of heaters overlaying a surface between burls of the substrate supporting area and being horizontally separated from the burls, and/or sensing elements of the plurality of temperature sensors overlaying a surface between burls of the substrate supporting area. | ||
| 地址 | Veldhoven NL | ||