发明名称 MULTIPLE-SURFACE IMPOSITION VAPOR DEPOSITION MASK
摘要 A method for producing a multiple-surface imposition vapor deposition mask that enhances definition and reduces weight even when a size is increased. Each of multiple masks in an open space in a frame is configured by a metal mask having a slit, and a resin mask that is positioned on a front surface of the metal mask and has openings corresponding to a pattern to be produced by vapor deposition arranged by lengthwise and crosswise in a plurality of rows. In formation of the plurality of masks, after each of the metal masks and a resin film material for producing the resin mask are attached to the frame, the resin film material is processed, and the openings corresponding to the pattern to be produced by vapor deposition are formed in a plurality of rows lengthwise and crosswise, whereby the multiple-surface imposition vapor deposition mask of the above described configuration is produced.
申请公布号 US2017110662(A1) 申请公布日期 2017.04.20
申请号 US201615391107 申请日期 2016.12.27
申请人 Dai Nippon Printing Co., Ltd. 发明人 HIROBE Yoshinori;MATSUMOTO Yutaka;USHIKUSA Masato;TAKEDA Toshihiko;OBATA Katsunari;NISHIMURA Hiroyuki
分类号 H01L51/00;C23C14/04;H01L51/56 主分类号 H01L51/00
代理机构 代理人
主权项 1. A multiple-surface imposition vapor deposition mask formed by arranging a plurality of masks in open space in a frame, the plurality of masks comprising: a metal mask provided with a slit, and a resin mask that is positioned on a front surface of the metal mask, and has openings corresponding to a pattern to be produced by vapor deposition, are stacked.
地址 Tokyo JP