| 发明名称 |
COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST |
| 摘要 |
Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer. |
| 申请公布号 |
US2017108776(A1) |
申请公布日期 |
2017.04.20 |
| 申请号 |
US201514605465 |
申请日期 |
2015.01.26 |
| 申请人 |
Rohm and Haas Electronic Materials LLC |
发明人 |
Cameron James F.;Sung Jin Wuk;Amara John P.;Prokopowicz Gregory P.;Valeri David A. |
| 分类号 |
G03F7/09;B05D3/02;B05D5/06;B05D7/00;C09D5/00;G03F7/11;G03F7/16;G03F7/20;G03F7/32;C09D133/12;B05D1/00;B05D3/06 |
主分类号 |
G03F7/09 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A coated substrate comprising:
(a) a coating composition layer comprising a resin, the resin comprising a reaction product of a diene and a dienophile; and (b) a photoresist layer over the coating composition layer. |
| 地址 |
Marlborough MA US |
