发明名称 |
VARIABLE RESISTIVE MEMORY DEVICE HAVING A PHASE CHANGE STRUCTURE AND METHOD OF MANUFACTURING THE SAME |
摘要 |
A variable resistive memory device may include a phase change region, a phase change layer, a gap-filling layer and an upper electrode. The phase change region may have a sidewall and a bottom surface. The phase change layer may have a linear shape extended along the bottom surface and the sidewall of the phase change region. The gap-filling layer may be formed in a portion of the phase change region surrounded by the phase change layer. The upper electrode may be formed on the phase change layer and the gap-filling layer. |
申请公布号 |
US2017104154(A1) |
申请公布日期 |
2017.04.13 |
申请号 |
US201614988868 |
申请日期 |
2016.01.06 |
申请人 |
SK hynix Inc. |
发明人 |
KIM Hyung Keun;LEE Byoung Ki;CHAE Su Jin |
分类号 |
H01L45/00 |
主分类号 |
H01L45/00 |
代理机构 |
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代理人 |
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主权项 |
1. A variable resistive memory device comprising:
a phase change region having a sidewall and a bottom surface; a linear phase change layer formed along the sidewall and the bottom surface of the phase change region; a gap-filling layer formed in the phase change region and surrounded by the phase change layer; and an upper electrode formed over the phase change layer and the gap-filling layer. |
地址 |
Gyeonggi-do KR |