Substrate processing apparatus and method for detecting an abnormality of an ozone gas concentration

摘要

A substrate processing apparatus is provided that includes an ozonizer for generating ozone gas and an ozone sensor for detecting an ozone gas concentration. The substrate processing apparatus processes a substrate by using the ozone gas supplied from the ozonizer. The substrate processing apparatus includes a monitor unit for monitoring the ozone gas concentration detected by the ozone sensor and a control unit for detecting an abnormality of the ozone gas concentration based on the monitored ozone gas concentration and the monitored discharge power.

主权项

1. A substrate processing apparatus for processing a substrate by using ozone gas comprising:
an ozonizer for generating ozone gas by using electrodes; an ozone sensor configured to detect an ozone gas concentration of the ozone gas generated by the ozonizer; a monitoring unit configured to monitor the ozone gas concentration detected by the ozone sensor and a discharge power that is electrical power output from the electrodes of the ozonizer; and a control unit configured to detect an abnormality of the ozone gas concentration based on the monitored ozone gas concentration and the monitored discharge power.