发明名称 Thin film transistor display panel and method of manufacturing the same
摘要 A thin film transistor display panel according to an exemplary embodiment of the present invention includes a substrate, a first insulating layer formed on the substrate, a semiconductor layer formed on the first insulating layer, a second insulating layer formed on the semiconductor layer, and a gate electrode formed on the second insulating layer, in which the first insulating layer includes a light blocking material, and a thickness of the first insulating layer is greater than or equal to a thickness of the second insulating layer.
申请公布号 US9620609(B2) 申请公布日期 2017.04.11
申请号 US201514830091 申请日期 2015.08.19
申请人 SAMSUNG DISPLAY CO., LTD. 发明人 Na Hyun Jae;Khang Yoon Ho;Park Sang Ho;Shim Dong Hwan;Yu Se Hwan;Lee Yong Su;Cha Myoung Geun
分类号 H01L29/786;H01L27/12;H01L29/49;H01L29/51;H01L33/34 主分类号 H01L29/786
代理机构 F. Chau & Associates, LLC 代理人 F. Chau & Associates, LLC
主权项 1. A thin film transistor display panel, comprising: a substrate; a first insulating layer formed on the substrate; a semiconductor layer formed on the first insulating layer; a second insulating layer formed on the semiconductor layer; and a gate electrode formed on the second insulating layer, wherein the first insulating layer includes a light blocking material, wherein the second insulating layer comprises a lower gate insulation film, a second light blocking member formed on the lower gate insulation film, and an upper gate insulation film formed on the second light blocking member, and wherein a thickness of the first insulating layer is greater than or equal to a thickness of the second insulating layer.
地址 Yongin, Gyeonggi-Do KR