Resist composition and method of forming resist pattern

摘要

A resist composition including a base component that exhibits changed solubility in an alkali developing solution under the action of acid, an acid-generator component that generates acid upon exposure, and a nitrogen-containing organic compound, the acid generator component including an acid generator represented by general formula (b0), the nitrogen-containing organic compound including a compound represented by general formula (d1) or general formula (d2) in which each of R1 and R2 represents an aryl group or an alkyl group, Rf represents a fluorinated alkyl group, X−represents a counter anion, each of R3 and R4 represents an aliphatic hydrocarbon group, R5 represents a hydrocarbon group having 5 or more carbon atoms, and each of R6 and R7 independently represents a hydrogen atom, an aliphatic hydrocarbon group, or —C(═O)—O—R5.;

主权项

1. A resist composition comprising a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid comprising a resin component (A1) comprising a structural unit (a1) derived from an acrylate ester containing an acetal-type acid-dissociable, dissolution-inhibiting group and a structural unit (a5) including at least one structural unit represented by general formulae (a5-1) and (a5-2) shown below,
an acid-generator component (B) which generates acid upon exposure comprising an acid generator (B1) consisting of a compound represented by general formula (b0) shown below, and a nitrogen-containing organic compound (D) comprising a compound represented by general formula (d2-3) shown below:wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, each of R55 and R56 independently represents a halogen atom, an alkyl group of 1 to 5 carbon atoms, an alkoxy group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, p represents an integer of 1 to 3 and q represents an integer of 0 to 4, provided that p+q is an integer of 1 to 5, Y3 represents a single bond or —C(═O)—O—R58— (wherein R58 represents a single bond or a divalent linking group), R57 represents a single bond or an alkylene group, x represents an integer of 1 to 3 and y represents an integer of 0 to 6, provided that x+y is an integer of 1 to 7,wherein each of R1 and R2 independently represents an aryl group which may have a substituent, Rf represents an unsubstituted fluorinated alkyl group, and X−represents a counter anion,wherein each R503 independently represents a linear or branched alkyl group of 5 or more carbon atoms which may have a substituent; and the plurality of R503 groups in the above formulas are the same or different.