| 发明名称 |
SUBSTRATE SUPPORT AND BAFFLE APPARATUS |
| 摘要 |
A substrate support apparatus is provided. The apparatus includes a circular base plate and one or more spacers disposed about a circumference of the base plate. The spacers may extend from a top surface of the base plate and a ring body may be coupled to the spacers. The ring body may be spaced from the base plate to define apertures between the base plate and the ring body. One or more support posts may be coupled to the base plate and extend therefrom. The support posts may be coupled to the base plate at positions radially inward from an inner surface of the ring body. |
| 申请公布号 |
US2017098542(A1) |
申请公布日期 |
2017.04.06 |
| 申请号 |
US201615268180 |
申请日期 |
2016.09.16 |
| 申请人 |
Applied Materials, Inc. |
发明人 |
GOUK Roman;CHEN Han-Wen;VERHAVERBEKE Steven;DELMAS Jean |
| 分类号 |
H01L21/02;H01L21/687;H01L21/67;B08B3/04 |
主分类号 |
H01L21/02 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A substrate support apparatus, comprising:
a circular base plate; one or more spacers disposed about a circumference of the base plate, the spacers extending from a top surface of the base plate; a ring body coupled to the spacers, wherein the ring body is spaced from the base plate to define apertures between the base plate and the ring body; and one or more support posts coupled to the base plate and extending therefrom, wherein the support posts are coupled to the base plate at positions radially inward from an inner surface of the ring body. |
| 地址 |
Santa Clara CA US |
