发明名称 |
SMALL THERMAL MASS PRESSURIZED CHAMBER |
摘要 |
Embodiments described herein generally relate to a processing chamber incorporating a small thermal mass which enable efficient temperature cycling for supercritical drying processes. The chamber generally includes a body, a liner, and an insulation element which enables the liner to exhibit a small thermal mass relative to the body. The chamber is also configured with suitable apparatus for generating and/or maintaining supercritical fluid within a processing volume of the chamber. |
申请公布号 |
US2017098555(A1) |
申请公布日期 |
2017.04.06 |
申请号 |
US201615268158 |
申请日期 |
2016.09.16 |
申请人 |
Applied Materials, Inc. |
发明人 |
GOUK Roman;CHEN Han-Wen;VERHAVERBEKE Steven;DELMAS Jean |
分类号 |
H01L21/67;F26B21/14;H01L21/677;B08B7/00;H01L21/02;H01L21/687 |
主分类号 |
H01L21/67 |
代理机构 |
|
代理人 |
|
主权项 |
1. A substrate processing apparatus, comprising:
a chamber body defining a processing volume for operating at elevated pressures, wherein the chamber body comprises:
a liner disposed within the chamber body adjacent the processing volume; andan insulation element disposed within the chamber body adjacent to the liner, wherein the insulation element has a coefficient of thermal expansion similar to a coefficient of thermal expansion of the chamber body and the liner; a substrate support disposed within the processing volume; and a baffle plate disposed within the processing volume. |
地址 |
Santa Clara CA US |