发明名称 SMALL THERMAL MASS PRESSURIZED CHAMBER
摘要 Embodiments described herein generally relate to a processing chamber incorporating a small thermal mass which enable efficient temperature cycling for supercritical drying processes. The chamber generally includes a body, a liner, and an insulation element which enables the liner to exhibit a small thermal mass relative to the body. The chamber is also configured with suitable apparatus for generating and/or maintaining supercritical fluid within a processing volume of the chamber.
申请公布号 US2017098555(A1) 申请公布日期 2017.04.06
申请号 US201615268158 申请日期 2016.09.16
申请人 Applied Materials, Inc. 发明人 GOUK Roman;CHEN Han-Wen;VERHAVERBEKE Steven;DELMAS Jean
分类号 H01L21/67;F26B21/14;H01L21/677;B08B7/00;H01L21/02;H01L21/687 主分类号 H01L21/67
代理机构 代理人
主权项 1. A substrate processing apparatus, comprising: a chamber body defining a processing volume for operating at elevated pressures, wherein the chamber body comprises: a liner disposed within the chamber body adjacent the processing volume; andan insulation element disposed within the chamber body adjacent to the liner, wherein the insulation element has a coefficient of thermal expansion similar to a coefficient of thermal expansion of the chamber body and the liner; a substrate support disposed within the processing volume; and a baffle plate disposed within the processing volume.
地址 Santa Clara CA US