发明名称 DIODE, SEMICONDUCTOR DEVICE, AND MOSFET
摘要 Disclosed is a technique capable of reducing loss at the time of switching in a diode. A diode disclosed in the present specification includes a cathode electrode, a cathode region made of a first conductivity type semiconductor, a drift region made of a low concentration first conductivity type semiconductor, an anode region made of a second conductivity type semiconductor, an anode electrode made of metal, a barrier region formed between the drift region and the anode region and made of a first conductivity type semiconductor having a concentration higher than that of the drift region, and a pillar region formed so as to connect the barrier region to the anode electrode and made of a first conductivity type semiconductor having a concentration higher than that of the barrier region. The pillar region and the anode are connected through a Schottky junction.
申请公布号 US2017098700(A1) 申请公布日期 2017.04.06
申请号 US201615342858 申请日期 2016.11.03
申请人 TOYOTA JIDOSHA KABUSHIKI KAISHA 发明人 YAMASHITA Yusuke;MACHIDA Satoru;SUGIYAMA Takahide;SAITO Jun
分类号 H01L29/739;H01L27/06;H01L29/08;H01L29/872;H01L29/16;H01L29/20;H01L29/40;H01L29/78;H01L29/06;H01L29/10 主分类号 H01L29/739
代理机构 代理人
主权项 1. A MOSFET comprising: a drain electrode; a drain region made of a first conductivity type semiconductor, a drift region made of a low concentration first conductivity type semiconductor; a body region made of a second conductivity type semiconductor; a source region made of the first conductivity type semiconductor; a source electrode made of metal; a gate electrode opposite to the body region between the source region and the drift region via an insulating film; a barrier region formed between the drift region and the body region and made of a first conductivity type semiconductor having a concentration higher than that of the drift region; and a pillar region formed so as to connect the barrier region to the source electrode and made of a first conductivity type semiconductor having a concentration higher than that of the barrier region, wherein the pillar region and the source electrode are connected through a Schottky junction.
地址 Toyota-shi JP