SCANNING MEASUREMENT SYSTEM

摘要

Controlling, based on characteristics, a lithographic apparatus having an exposure mode configured to expose a wafer held by a substrate table to an image of a pattern on a production reticle via a projection system, wherein in the exposure mode the production reticle is held at a reticle stage and is protected by a pellicle, the method comprising determining the characteristics of the projecting in a calibration mode, and the controlling comprising moving in the exposure mode at least one of the projection system, the reticle stage and the substrate table during the exposing in dependence on the characteristics.