发明名称 |
REMOTE PLASMA AND ELECTRON BEAM GENERATION SYSTEM FOR A PLASMA REACTOR |
摘要 |
Embodiments of an apparatus having an improved coil antenna assembly with a remote plasma source and an electron beam generation system that can provide enhanced plasma in a processing chamber. In one embodiment, a plasma processing chamber includes a chamber body, a lid enclosing an interior volume of the chamber body, a substrate support disposed in the interior volume, a dual inductively coupled source including a coil antenna assembly coupled to the chamber body through the lid, and a remote plasma source coupled to the chamber body through the lid. |
申请公布号 |
US2017092467(A1) |
申请公布日期 |
2017.03.30 |
申请号 |
US201514968121 |
申请日期 |
2015.12.14 |
申请人 |
Applied Materials, Inc. |
发明人 |
DHINDSA Rajinder |
分类号 |
H01J37/32;C23C14/22;H01L21/67;C23C16/505 |
主分类号 |
H01J37/32 |
代理机构 |
|
代理人 |
|
主权项 |
1. A plasma processing chamber comprising:
a chamber body; a lid enclosing an interior volume of the chamber body; a substrate support disposed in the interior volume; a dual inductively coupled source including a coil antenna assembly coupled to the chamber body through the lid; and a remote plasma source coupled to the chamber body through the lid. |
地址 |
Santa Clara CA US |