发明名称 REMOTE PLASMA AND ELECTRON BEAM GENERATION SYSTEM FOR A PLASMA REACTOR
摘要 Embodiments of an apparatus having an improved coil antenna assembly with a remote plasma source and an electron beam generation system that can provide enhanced plasma in a processing chamber. In one embodiment, a plasma processing chamber includes a chamber body, a lid enclosing an interior volume of the chamber body, a substrate support disposed in the interior volume, a dual inductively coupled source including a coil antenna assembly coupled to the chamber body through the lid, and a remote plasma source coupled to the chamber body through the lid.
申请公布号 US2017092467(A1) 申请公布日期 2017.03.30
申请号 US201514968121 申请日期 2015.12.14
申请人 Applied Materials, Inc. 发明人 DHINDSA Rajinder
分类号 H01J37/32;C23C14/22;H01L21/67;C23C16/505 主分类号 H01J37/32
代理机构 代理人
主权项 1. A plasma processing chamber comprising: a chamber body; a lid enclosing an interior volume of the chamber body; a substrate support disposed in the interior volume; a dual inductively coupled source including a coil antenna assembly coupled to the chamber body through the lid; and a remote plasma source coupled to the chamber body through the lid.
地址 Santa Clara CA US