发明名称 THERMALLY INSULATED RESISTIVE RANDOM ACCESS MEMORY
摘要 An embodiment includes a resistive random access memory (RRAM) comprising: a top electrode portion and a bottom electrode portion; and an oxide layer between the top and bottom electrode portions; wherein (a) a conductive filament is within the oxide layer and is adjacent the top electrode portion, (b) the oxide layer includes oxide layer sidewalls, (c) a vertical axis intersects the oxide layer and the top and bottom electrode portions and is parallel to the oxide layer sidewalls, and (d) a void, which includes air, is adjacent the oxide layer sidewalls. Other embodiments are described herein.
申请公布号 WO2017052583(A1) 申请公布日期 2017.03.30
申请号 WO2015US52198 申请日期 2015.09.25
申请人 INTEL CORPORATION 发明人 KARPOV, Elijah V.;SHAH, Uday;MAJHI, Prashant;MUKHERJEE, Niloy;PILLARISETTY, Ravi
分类号 H01L27/115 主分类号 H01L27/115
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