| 发明名称 | Method for atomic layer deposition | ||
| 摘要 | An atomic layer deposition method is disclosed for preparing polypeptides. The method comprises providing a solid-phase support comprising a reactive amine monolayer in an atomic layer deposition (ALD) chamber. The solid-phase support is contacted with a first protected amino acid substituted with a protecting group by atomic layer deposition, wherein the protecting group is bonded to a non-side chain amino group of the protected amino acid. A carboxylic acid group of the first protected amino acid is reacted with the reactive amine monolayer, thereby coupling the first protected amino acid to the solid-phase support to produce a coupled-product. | ||
| 申请公布号 | US9605344(B2) | 申请公布日期 | 2017.03.28 |
| 申请号 | US201414917566 | 申请日期 | 2014.09.12 |
| 申请人 | STC.UNM | 发明人 | Jiang Ying-Bing;Cecchi Joseph L.;Fu Yaqin;Brinker C. Jeffrey |
| 分类号 | C23C16/455;C23C16/46 | 主分类号 | C23C16/455 |
| 代理机构 | MH2 Technology Law Group, LLP | 代理人 | MH2 Technology Law Group, LLP |
| 主权项 | 1. An atomic layer deposition method for preparing polypeptides, the method comprising: providing a solid-phase support comprising a reactive amine monolayer in an atomic layer deposition (ALD) chamber; contacting the solid-phase support with a first protected amino acid substituted with a protecting group by atomic layer deposition, wherein the protecting group is bonded to a non-side chain amino group of the protected amino acid; and reacting a carboxylic acid group of the first protected amino acid with the reactive amine monolayer, thereby coupling the first protected amino acid to the solid-phase support to produce a coupled-product. | ||
| 地址 | Albuquerque NM US | ||