发明名称 Heterosection tunnel field-effect transistor (TFET)
摘要 A Tunnel Field-Effect Transistor (TFET) device is provided comprising at least one heterosection between the source region and the channel region. The at least one heterosection has a low dielectric constant and thickness below 10 nm. Additionally a pocket region and another heterosection may be added in between the at least one heterosection and the channel region.
申请公布号 US9608094(B2) 申请公布日期 2017.03.28
申请号 US201514841566 申请日期 2015.08.31
申请人 IMEC VZW 发明人 Verhulst Anne S.;Pourtois Geoffrey;Rooyackers Rita
分类号 H01L29/78;H01L29/94;H01L29/772;H01L29/775;H01L29/778;H01L29/66;H01L29/08;H01L29/10;H01L29/205;H01L29/739 主分类号 H01L29/78
代理机构 Knobbe Martens Olson & Bear, LLP 代理人 Knobbe Martens Olson & Bear, LLP
主权项 1. A tunnel field-effect transistor, comprising: a doped source region comprising a source semiconductor material having a source doping type; a doped drain region comprising a drain semiconductor material having a drain doping type opposite to the source doping type; a channel region comprising a lowly doped channel semiconductor material or an undoped channel semiconductor material, the channel region situated between the doped source region and the doped drain region; at least one doped heterosection between the doped source region and the channel region, the at least one doped heterosection having a heterosection doping type which is identical to the source doping type, the at least one doped heterosection comprising a semiconductor material which is at least partially different from semiconductor materials of neighboring regions with which the at least one doped heterosection is in direct physical contact, the at least one doped heterosection having a dielectric constant lower than 10, and the at least one doped heterosection having a thickness not larger than 10 nm, wherein the neighboring regions of the at least one doped heterosection comprise at least the doped source region and at least one region selected from the group consisting of the channel region, a pocket region, and another doped heterosection, and wherein the pocket region in between the at least one doped heterosection and the channel region comprises a pocket semiconductor material which is different from the semiconductor material of the at least one doped heterosection and with a pocket doping type which is opposite to the source doping type.
地址 Leuven BE