发明名称 Storage Capacitors for Displays and Methods for Forming the Same
摘要 Embodiments provided herein describe storage capacitors for active matrix displays and methods for making such capacitors. A substrate is provided. A bottom electrode is formed above the substrate. A dielectric layer is formed above the bottom electrode. A top electrode is formed above the dielectric layer. A layer including an amorphous or crystalline material may be formed between the dielectric layer and the top electrode. The bottom electrode may have a thickness of at least 1000 Å, be formed in a gaseous environment of at least 95% argon, and/or not undergo an annealing process before the formation of a dielectric layer above the bottom electrode. The dielectric layer may include a nitrided high-k dielectric material.
申请公布号 US2017084643(A1) 申请公布日期 2017.03.23
申请号 US201615264822 申请日期 2016.09.14
申请人 Intermolecular, Inc. 发明人 Saraf Gaurav;Lin Howard;Phatak Prashant;Lee Sang;Le Minh Huu;Pham Hieu;Yi Congwen
分类号 H01L27/12;H01L21/02;H01L21/285;H01L49/02 主分类号 H01L27/12
代理机构 代理人
主权项 1. A method for forming a storage capacitor for an active matrix display, the method comprising: providing a substrate; forming a bottom electrode above the substrate; forming a dielectric layer above the dielectric layer, wherein the dielectric layer comprises a high-k dielectric material; forming an intermediate layer above the dielectric layer, wherein the intermediate layer comprises an amorphous or micro-crystalline material; and forming a top electrode above the intermediate layer.
地址 San Jose CA US