发明名称 |
Storage Capacitors for Displays and Methods for Forming the Same |
摘要 |
Embodiments provided herein describe storage capacitors for active matrix displays and methods for making such capacitors. A substrate is provided. A bottom electrode is formed above the substrate. A dielectric layer is formed above the bottom electrode. A top electrode is formed above the dielectric layer. A layer including an amorphous or crystalline material may be formed between the dielectric layer and the top electrode. The bottom electrode may have a thickness of at least 1000 Å, be formed in a gaseous environment of at least 95% argon, and/or not undergo an annealing process before the formation of a dielectric layer above the bottom electrode. The dielectric layer may include a nitrided high-k dielectric material. |
申请公布号 |
US2017084643(A1) |
申请公布日期 |
2017.03.23 |
申请号 |
US201615264822 |
申请日期 |
2016.09.14 |
申请人 |
Intermolecular, Inc. |
发明人 |
Saraf Gaurav;Lin Howard;Phatak Prashant;Lee Sang;Le Minh Huu;Pham Hieu;Yi Congwen |
分类号 |
H01L27/12;H01L21/02;H01L21/285;H01L49/02 |
主分类号 |
H01L27/12 |
代理机构 |
|
代理人 |
|
主权项 |
1. A method for forming a storage capacitor for an active matrix display, the method comprising:
providing a substrate; forming a bottom electrode above the substrate; forming a dielectric layer above the dielectric layer, wherein the dielectric layer comprises a high-k dielectric material; forming an intermediate layer above the dielectric layer, wherein the intermediate layer comprises an amorphous or micro-crystalline material; and forming a top electrode above the intermediate layer. |
地址 |
San Jose CA US |