| 摘要 |
A method of fabricating a phase plate (100), for use in a transmission electron microscope, with simple process steps is offered. The method includes a step (S100) of forming a first layer (22) on a substrate, a step (S102) of patterning the first layer (22) to form through-holes (2) extending through the first layer (22), a step (S104) of etching the surface of the substrate (10) opposite to the surface on which the first layer (22) is formed to form an opening (4) which is in communication with the through-holes (2) and which exposes the first layer (22), and a step (S106) of forming a second layer (24) on the first layer (22). |
