发明名称 ターゲット供給装置及び極端紫外光生成装置
摘要 A target supply device may include a receptacle for holding a liquid target material, a first electrode disposed within the receptacle, a nozzle portion provided in the receptacle, a second electrode provided with a first path and disposed facing the nozzle portion, a third electrode provided with a second path that, along with the first path, defines a trajectory of the liquid target material released from the nozzle portion, a first power source that applies a first potential that is higher than a common potential to the first electrode, a second power source that applies a second potential that is lower than the common potential to the third electrode, and a third power source that applies a third potential that is no greater than the first potential and is no less than the second potential to the second electrode.
申请公布号 JP6101451(B2) 申请公布日期 2017.03.22
申请号 JP20120189886 申请日期 2012.08.30
申请人 ギガフォトン株式会社 发明人 梅田 博
分类号 H05G2/00 主分类号 H05G2/00
代理机构 代理人
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