| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which can be cured at low-temperature, allows a cured film excellent in elongation, electric insulation and metal corrosion resistance, and prevents occurrence of wrinkle, swelling, poor appearance and the like in the metal film and the cured film even when a metal film is formed by sputtering treatment.SOLUTION: A photosensitive resin composition contains a phenol resin mixture comprising a phenol resin having a repeated structure represented by the general formula (1) [in the formula, a is an integer of 0 to 3; Rrepresents a monovalent substituent selected from a monovalent organic group having a carbon number of 1 to 20, a halogen atom, a nitro group and a cyano group; and X represents a divalent organic group selected from a divalent chain aliphatic group having a carbon number of 2 to 10, a divalent alicyclic group having a carbon number of 3 to 20, an alkylene oxide group having a carbon number of 1 to 10 and a divalent organic group having an aromatic ring], and at least one kind of phenol resins selected from the consisting of a novolac resin and a polyhydroxystyrene resin at a prescribed ratio; a photoacid-generating agent; a solvent; and a crosslinking agent. |
