发明名称 |
Photosintering of micron-sized copper particles |
摘要 |
Micron-sized metal particles in an ink or paste composition are deposited onto a substrate and then photosimered. The substrate may comprise a polymeric material. The polymeric substrate may have a coefficient of thermal expansion greater than two times the coefficient of thermal expansion of the photosimered ink or paste composition. |
申请公布号 |
US9598776(B2) |
申请公布日期 |
2017.03.21 |
申请号 |
US201314413294 |
申请日期 |
2013.07.09 |
申请人 |
PEN Inc. |
发明人 |
Abed Ovadia;Ginsberg Valerie Kaye;Novak James P. |
分类号 |
B05D3/02;B05D3/06;C23C24/10;H01B1/22;H05K1/09;C09D11/52;H05K3/12 |
主分类号 |
B05D3/02 |
代理机构 |
Matheson Keys Daffer & Kordzik PLLC |
代理人 |
Kordzik Kelly;Matheson Keys Daffer & Kordzik PLLC |
主权项 |
1. A method for making a conductive film comprising:
depositing an ink or paste composition comprising micron-sized metal particles onto a polymeric substrate having a melting point less than 200° C., wherein the micron-sized metal particles in the ink or paste composition have an average particle size greater than one micron; and photosintering the ink or paste composition after being deposited onto the substrate, wherein during the photosintering of the ink or paste composition, some heat generated in the micron-sized metal particles as a result of the photosintering is transferred from the particles into the substrate to reduce ramping up of the heat within the particles, which also results in a partial melting of a surface of the substrate so that some of the particles physically embed into the substrate surface. |
地址 |
Deerfield Beach FL US |