发明名称 Photosintering of micron-sized copper particles
摘要 Micron-sized metal particles in an ink or paste composition are deposited onto a substrate and then photosimered. The substrate may comprise a polymeric material. The polymeric substrate may have a coefficient of thermal expansion greater than two times the coefficient of thermal expansion of the photosimered ink or paste composition.
申请公布号 US9598776(B2) 申请公布日期 2017.03.21
申请号 US201314413294 申请日期 2013.07.09
申请人 PEN Inc. 发明人 Abed Ovadia;Ginsberg Valerie Kaye;Novak James P.
分类号 B05D3/02;B05D3/06;C23C24/10;H01B1/22;H05K1/09;C09D11/52;H05K3/12 主分类号 B05D3/02
代理机构 Matheson Keys Daffer & Kordzik PLLC 代理人 Kordzik Kelly;Matheson Keys Daffer & Kordzik PLLC
主权项 1. A method for making a conductive film comprising: depositing an ink or paste composition comprising micron-sized metal particles onto a polymeric substrate having a melting point less than 200° C., wherein the micron-sized metal particles in the ink or paste composition have an average particle size greater than one micron; and photosintering the ink or paste composition after being deposited onto the substrate, wherein during the photosintering of the ink or paste composition, some heat generated in the micron-sized metal particles as a result of the photosintering is transferred from the particles into the substrate to reduce ramping up of the heat within the particles, which also results in a partial melting of a surface of the substrate so that some of the particles physically embed into the substrate surface.
地址 Deerfield Beach FL US
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