发明名称 |
Micro electro mechanical system, semiconductor device, and manufacturing method thereof |
摘要 |
The present invention provides a MEMS and a sensor having the MEMS which can be formed without a process of etching a sacrifice layer. The MEMS and the sensor having the MEMS are formed by forming an interspace using a spacer layer. In the MEMS in which an interspace is formed using a spacer layer, a process for forming a sacrifice layer and an etching process of the sacrifice layer are not required. As a result, there is no restriction on the etching time, and thus the yield can be improved. |
申请公布号 |
US9597933(B2) |
申请公布日期 |
2017.03.21 |
申请号 |
US201514730362 |
申请日期 |
2015.06.04 |
申请人 |
Semiconductor Energy Laboratory Co., Ltd. |
发明人 |
Yamaguchi Mayumi;Izumi Konami;Tateishi Fuminori |
分类号 |
H01L21/00;B60C23/04;B60C23/20;A61B5/00;B81C1/00;G01L1/16;G01L17/00;H01L27/20;H01L41/311;H01L41/313;H01L21/02;H01L21/54;H01L23/00;H01L35/34;H01L41/25;A61B5/024 |
主分类号 |
H01L21/00 |
代理机构 |
Fish & Richardson P.C. |
代理人 |
Fish & Richardson P.C. |
主权项 |
1. A tire comprising a wheel and a semiconductor device attached to the wheel, the semiconductor device comprising:
a transistor; an insulating layer over the transistor; a sensor over the insulating layer, the sensor electrically connected to the transistor; a first spacer layer configured to form first interspace between the insulating layer and the sensor; a substrate over the sensor; and a second spacer layer configured to form second interspace between the substrate and the sensor, wherein the second spacer layer is located over the first spacer layer, and wherein the second spacer layer overlaps with the first spacer layer. |
地址 |
Atsugi-shi, Kanagawa-ken JP |