NOVEL PHOTORESIST HAVING SENSITIZER BONDED TO ACID GENERATOR

摘要

The present disclosure is directed to a photoresist and a method of performing a lithography process using the photoresist. The photoresist contains a polymer and a photo-acid generator. The photo-acid generator contains a sensitizer component, an acid generator component, and a bonding component that bonds the sensitizer component to the acid generator component. The bonding component may be either a single bond or a conjugated bond. The lithography process may be an EUV lithography process or an e-beam lithography process.

主权项

1. A photoresist, comprising:
a polymer; and a photo-acid generator that contains:
a sensitizer component;an acid generator component; anda bonding component that bonds the sensitizer component to the acid generator component, wherein the bonding component includes a conjugated bond.