VACUUM PROCESSING APPARATUS AND METHOD FOR VACUUM PROCESSING SUBSTRATES

摘要

A vacuum treatment apparatus comprising a vacuum treatment recipient (12) with at least one circular opening (13) between an inside (i) and exterior (e) of said recipient (12). Said recipient houses a turntable (1), which defines a plane (P) along its table surface; is drivingly rotatable around a central axis (B) perpendicular to plane (P), and exhibits a plurality of circular substrates supports (2,...9); whereby said at least one opening (13) is arranged such that during a turn of the turntable (1) the area of each of the substrate supports (2,....9) and the opening (13) are fully aligned and completely face each other; the vacuum treatment apparatus further comprising; a PVD deposition source (14) attached to said at least one opening (13), whereby said PVD source exhibits at least a circular material target (15) and the static magnet arrangement (11) and said magnet arrangement is arranged in a plane (M) in parallel to plane (P) and is not rotational symmetric around a central axis (C) running centrally through said magnet arrangement and being perpendicular to said plane (M).