发明名称 SEMICONDUCTOR DEVICE
摘要 A semiconductor device includes a semiconductor substrate with: a drift layer; a base layer; and a collector layer and a cathode layer. In the semiconductor substrate, when a region operating as an IGBT device is an IGBT region and a region operating as a diode device is a diode region, the IGBT and diode regions are arranged alternately in a repetitive manner; a damaged region is arranged on a surface portion of the diode region in the semiconductor substrate. The IGBT and diode regions are demarcated by a boundary between the collector and cathode layers; and a surface portion of the IGBT region includes: a portion having the damaged region at a boundary side with the diode region; and another portion without the damaged region arranged closer to an inner periphery side relative to the boundary side.
申请公布号 US2017077216(A1) 申请公布日期 2017.03.16
申请号 US201515123404 申请日期 2015.01.29
申请人 DENSO CORPORATION 发明人 KOUNO Kenji
分类号 H01L29/06;H01L29/739;H01L21/22;H01L29/10;H01L29/66;H01L27/06;H01L29/861 主分类号 H01L29/06
代理机构 代理人
主权项 1. A semiconductor device comprising: a semiconductor substrate including: a drift layer having a first conductivity type;a base layer having a second conductivity type that is arranged at a surface portion of the drift layer; anda collector layer having the second conductivity type and a cathode layer having the first conductivity type that are arranged at a side of the drift layer opposite to another side of the drift layer facing the base layer, wherein: when a region operating as an IGBT device in the semiconductor substrate is an IGBT region and a region operating as a diode device in the semiconductor substrate is a diode region, the IGBT region and the diode region are arranged alternately in a repetitive manner; a damaged region is arranged at a surface portion of the diode region in the semiconductor substrate; the IGBT region and the diode region are demarcated by a boundary between the collector layer and the cathode layer; and a surface portion of the IGBT region includes: a portion that has the damaged region, which has a length along a surface direction of the semiconductor substrate equal to or larger than the thickness of the semiconductor substrate, at a boundary side with the diode region; and another portion not having the damaged region that is arranged closer to an inner periphery side relative to the boundary side.
地址 Kariya-city, Aichi-pref. JP