发明名称 METAL ON BOTH SIDES WITH CLOCK GATED-POWER AND SIGNAL ROUTING UNDERNEATH
摘要 A method including forming a plurality of first interconnects and a plurality of second interconnects on opposite sides of an integrated circuit device layer including a plurality of circuit devices, wherein the plurality of second interconnects include interconnects of different dimensions; and forming contact points to the second plurality of interconnects, the contact points operable for connection to an external source. An apparatus including a substrate including a plurality of first interconnects and a plurality of second interconnects on opposite sides of an integrated circuit device layer including a plurality of circuit devices, wherein the plurality of second interconnects include interconnects of different dimensions; and contact points coupled to the second plurality of interconnects, the contact points operable for connection to an external source.
申请公布号 US2017077030(A1) 申请公布日期 2017.03.16
申请号 US201415122913 申请日期 2014.09.27
申请人 Intel Corporation 发明人 NELSON Donald W.;MORROW Patrick;JUN Kimin
分类号 H01L23/528;H01L29/78;H01L23/00;H01L21/768 主分类号 H01L23/528
代理机构 代理人
主权项 1. A method comprising: forming a plurality of first interconnects and a plurality of second interconnects on opposite sides of an integrated circuit device layer comprising a plurality of circuit devices, wherein the plurality of second interconnects include interconnects of different dimensions; and forming contact points to the second plurality of interconnects, the contact points operable for connection to an external source.
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