发明名称 POLISHING LIQUID, POLISHING LIQUID SET, AND SUBSTRATE POLISHING METHOD
摘要 Provided is a polishing liquid comprising a liquid vehicle, abrasive grains, and a polymer. The polymer has a first molecular chain where functional groups are directly bonded and a second molecular chain branched from the first molecular chain. The functional groups are at least one selected from the group consisting of carboxyl, carboxylate, hydroxyl, sulfo, and sulfonate groups.
申请公布号 WO2017043139(A1) 申请公布日期 2017.03.16
申请号 WO2016JP67585 申请日期 2016.06.13
申请人 HITACHI CHEMICAL COMPANY, LTD. 发明人 AKUTSU Toshiaki;MINAMI Hisataka;IWANO Tomohiro;YAMASHITA Tetsuro;AOKI Masako;FUKASAWA Masato
分类号 C09K3/14;B24B37/00;H01L21/304 主分类号 C09K3/14
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