发明名称 |
POLISHING LIQUID, POLISHING LIQUID SET, AND SUBSTRATE POLISHING METHOD |
摘要 |
Provided is a polishing liquid comprising a liquid vehicle, abrasive grains, and a polymer. The polymer has a first molecular chain where functional groups are directly bonded and a second molecular chain branched from the first molecular chain. The functional groups are at least one selected from the group consisting of carboxyl, carboxylate, hydroxyl, sulfo, and sulfonate groups. |
申请公布号 |
WO2017043139(A1) |
申请公布日期 |
2017.03.16 |
申请号 |
WO2016JP67585 |
申请日期 |
2016.06.13 |
申请人 |
HITACHI CHEMICAL COMPANY, LTD. |
发明人 |
AKUTSU Toshiaki;MINAMI Hisataka;IWANO Tomohiro;YAMASHITA Tetsuro;AOKI Masako;FUKASAWA Masato |
分类号 |
C09K3/14;B24B37/00;H01L21/304 |
主分类号 |
C09K3/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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