发明名称 |
FLUORINATED STRUCTURED ORGANIC FILM PHOTORECEPTOR LAYERS |
摘要 |
A method of forming an overcoat layer. The method comprises providing a substrate having an imaging structure formed thereon, the imaging structure comprising (i) a charge transport layer and a charge generating layer, or (ii) an imaging layer comprising both charge generating material and charge transport material. An overcoat composition is deposited on the imaging structure, the overcoat composition comprising a charge transport molecule, a fluorinated building block, a leveling agent, a liquid carrier and optionally a first catalyst. The fluorinated building block is a fluorinated alkyl monomer substituted at the α and ω positions with a hydroxyl, carboxyl, carbonyl or aldehyde functional group or the anhydrides of any of those functional groups. The overcoat composition is cured to form an overcoat layer that is a fluorinated structured organic film, the curing comprising treating an outer surface of the overcoat composition with at least one cross-linking process. The crosslinking process forms a cross-linking gradient in the overcoat layer. If the overcoat composition comprises the first catalyst, there is an insufficient amount of the first catalyst to fully cross-link the overcoat layer. |
申请公布号 |
US2017075238(A1) |
申请公布日期 |
2017.03.16 |
申请号 |
US201615283090 |
申请日期 |
2016.09.30 |
申请人 |
XEROX CORPORATION |
发明人 |
McGuire Gregory;Cote Adrien P.;Klenkler Richard A.;Gagnon Yvan |
分类号 |
G03G5/147;G03G15/00;G03G5/06 |
主分类号 |
G03G5/147 |
代理机构 |
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代理人 |
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主权项 |
1. A photoreceptor, comprising:
a substrate comprising an electrically conductive material; an imaging structure formed on the substrate, the imaging structure comprising (i) a charge transport layer and a charge generating layer, or (ii) an imaging layer comprising both charge generating material and charge transport material; and an overcoat layer on the imaging structure, the overcoat layer comprising a fluorinated structured organic film having a cross-link gradient, wherein a degree of cross-linking is greatest at a portion of the overcoat layer that is distal to the imaging structure. |
地址 |
NORWALK CT US |