发明名称 |
SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
According to one embodiment, a semiconductor memory device includes a stacked body including a plurality of electrode members and a plurality of insulating members, each of the electrode members and each of the insulating members being stacked alternately in a first direction on the substrate. The semiconductor memory device also includes a memory hole that extends in the stacked body in the first direction and a semiconductor member that is disposed to extend in the memory hole in the first direction. The semiconductor memory device also includes a memory member that is disposed between the semiconductor member and the plurality of electrode members. The plurality of electrode members including a first electrode member and a second electrode member, a thickness of the memory member at the position of the first electrode member being greater than a thickness of the memory member at the position of the second electrode member. |
申请公布号 |
US2017077109(A1) |
申请公布日期 |
2017.03.16 |
申请号 |
US201615343591 |
申请日期 |
2016.11.04 |
申请人 |
Kabushiki Kaisha Toshiba |
发明人 |
YASUDA Naoki |
分类号 |
H01L27/115;H01L21/28;H01L29/51;H01L29/10;H01L29/423 |
主分类号 |
H01L27/115 |
代理机构 |
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代理人 |
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主权项 |
1. A semiconductor memory device comprising:
a substrate; a stacked body including a plurality of electrode members and a plurality of insulating members, each of the electrode members and each of the insulating members being stacked alternately in a first direction on the substrate; a memory hole that extends in the stacked body in the first direction; a semiconductor member that is disposed to extend in the memory hole in the first direction; and a memory member that is disposed between the semiconductor member and the plurality of electrode members, the plurality of electrode members including a first electrode member and a second electrode member, a diameter of the memory hole at a position of the first electrode member being smaller than a diameter of the memory hole at a position of the second electrode member, and a thickness of the memory member at the position of the first electrode member being greater than a thickness of the memory member at the position of the second electrode member. |
地址 |
Minato-ku JP |