发明名称 SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 According to one embodiment, a semiconductor memory device includes a stacked body including a plurality of electrode members and a plurality of insulating members, each of the electrode members and each of the insulating members being stacked alternately in a first direction on the substrate. The semiconductor memory device also includes a memory hole that extends in the stacked body in the first direction and a semiconductor member that is disposed to extend in the memory hole in the first direction. The semiconductor memory device also includes a memory member that is disposed between the semiconductor member and the plurality of electrode members. The plurality of electrode members including a first electrode member and a second electrode member, a thickness of the memory member at the position of the first electrode member being greater than a thickness of the memory member at the position of the second electrode member.
申请公布号 US2017077109(A1) 申请公布日期 2017.03.16
申请号 US201615343591 申请日期 2016.11.04
申请人 Kabushiki Kaisha Toshiba 发明人 YASUDA Naoki
分类号 H01L27/115;H01L21/28;H01L29/51;H01L29/10;H01L29/423 主分类号 H01L27/115
代理机构 代理人
主权项 1. A semiconductor memory device comprising: a substrate; a stacked body including a plurality of electrode members and a plurality of insulating members, each of the electrode members and each of the insulating members being stacked alternately in a first direction on the substrate; a memory hole that extends in the stacked body in the first direction; a semiconductor member that is disposed to extend in the memory hole in the first direction; and a memory member that is disposed between the semiconductor member and the plurality of electrode members, the plurality of electrode members including a first electrode member and a second electrode member, a diameter of the memory hole at a position of the first electrode member being smaller than a diameter of the memory hole at a position of the second electrode member, and a thickness of the memory member at the position of the first electrode member being greater than a thickness of the memory member at the position of the second electrode member.
地址 Minato-ku JP