| 摘要 |
[Problem] To provide a resin composition for optical stereolithography which does not include a toxic antimony-based cationic polymerization initiator, which is safe and exhibits excellent handling properties, and which provides stereolithographic products exhibiting excellent external appearance and excellent colour tones which do not yellow, and which have colourless translucency. [Solution] This resin composition for optical stereolithography includes a cation-polymerizable organic compound, a radical polymerizable organic compound, a cationic polymerization initiator, and a radical polymerization initiator. The resin composition for optical stereolithography further includes, as the cationic polymerization initiator, an aromatic sulfonium compound represented by general formula (C-1) and an aromatic sulfonium compound represented by general formula (C-2) (in general formula (C-1) and general formula (C-2): R1, R2, R3, R4, R5, and R6 each represent a monovalent organic group; Rf is a fluoroalkyl group; m is the same number as the cationic charge of the "cation (S+(R1)(R2)(R3))" in general formula (C-1); n is an integer in the range of 1-5; and p is the same number as the cationic charge of the "cation (S+(R4)(R5)(R6))" in general formula (C-2)). |
