发明名称 APPARATUS AND METHOD FOR DETECTING POSITION, EXPOSURE APPARATUS, AND METHOD FOR THE SAME
摘要 A position detecting apparatus that detects a position of an object by detecting a mark on the object includes a light receiving element, a control unit, a light source, and an adjusting unit. The light receiving element receives light from the mark and accumulates the light as signals. The control unit detects a position of the mark based on the light from the mark. The light source illuminates the mark. The adjusting unit adjusts an amount of light applied to the mark. The control unit determines the amount of the light from the mark based on the accumulated signals in parallel with a term during which the accumulated signals are transferred to the control unit. The control unit adjusts the amount of light applied to the mark based on the amount of the light from the mark or detects the position of the mark based on the light from the mark.
申请公布号 US2017060003(A1) 申请公布日期 2017.03.02
申请号 US201615242230 申请日期 2016.08.19
申请人 CANON KABUSHIKI KAISHA 发明人 Miyazaki Tadaki
分类号 G03F7/20;G01B11/14;H05B37/02;G01J1/42 主分类号 G03F7/20
代理机构 代理人
主权项 1. A position detecting apparatus that detects a position of an object by detecting a mark on the object, the apparatus comprising: a light receiving element configured to receive light from the mark and accumulate the light as signals; a control unit configured to detect a position of the mark based on the light from the mark received by the light receiving element; a light source configured to illuminate the mark; and an adjusting unit configured to adjust an amount of light applied to the mark, wherein the control unit determines the amount of the light from the mark based on the accumulated signals in a term overlapping with another term during which the accumulated signals are transferred to the control unit, and wherein the control unit adjusts the amount of light applied to the mark based on the amount of the light from the mark by controlling the adjusting unit or detects the position of the mark based on the light from the mark received by the light receiving element.
地址 Tokyo JP