| 摘要 |
The present invention provides an adjustable guided rake apparatus and method which enables an adjustable guided rake user to configure an adjustable rake guide to a specified height in relation to a secondary surface, which will then define the height of the grading edge of the grading rake head in relation to a primary surface. The adjustable guided rake user is able to move the grading rake head along a primary surface, in order to shift material along the surface, while the adjustable rake guide runs along the secondary surface, guiding the grading rake head. |
