发明名称 Automatic generation of reference spectra for optical monitoring of substrates
摘要 A computer-implemented method of generating reference spectra includes polishing a first substrate in a polishing apparatus having a rotatable platen, measuring a sequence of spectra from the substrate during polishing with an in-situ monitoring system, associating each spectrum in the sequence of spectra with a index value equal to a number of platen rotations at which the each spectrum was measured, and storing the sequence of spectra as reference spectra.
申请公布号 US9579767(B2) 申请公布日期 2017.02.28
申请号 US201113087789 申请日期 2011.04.15
申请人 Applied Materials, Inc. 发明人 Qian Jun;Lee Harry Q.
分类号 B24B49/12;B24B37/013;B24B37/04;B24B37/10;B24B37/20;B24B49/04 主分类号 B24B49/12
代理机构 Fish & Richardson P.C. 代理人 Fish & Richardson P.C.
主权项 1. A computer-implemented method of generating reference spectra, comprising: polishing a first substrate in a polishing apparatus having a rotatable platen; measuring a first sequence of spectra from the first substrate during polishing with a first in-situ monitoring system; associating each spectrum in the first sequence of spectra with an index value equal to a number of platen rotations at which the each spectrum was measured; storing the first sequence of spectra as reference spectra; receiving data from a second in-situ monitoring system that monitors the first substrate during polishing of the first substrate; detecting a polishing endpoint of the first substrate during polishing of the first substrate based on the data from the second in-situ monitoring system and without accessing data from the first in-situ monitoring system to detect the polishing endpoint; determining a target index value based on the number of platen rotations at the time the polishing endpoint is detected by the second in-situ monitoring system; polishing a second substrate in the polishing apparatus; measuring a second sequence of spectra from the second substrate during polishing with the first in-situ monitoring system and without the second in-situ monitoring system; and adjusting a polishing parameter for at least one zone on the second substrate to adjust a polishing rate of the at least one zone based on the reference spectra, the second sequence of spectra, and the target index value.
地址 Santa Clara CA US