发明名称 |
Metal pretreatment composition containing zirconium, copper, and metal chelating agents and related coatings on metal substrates |
摘要 |
Disclosed is a zirconium-based metal pretreatment coating composition that includes a metal chelator that chelates copper in the metal pretreatment coating composition and thereby improves adhesion of paints to a metal substrate coated with the pretreatment coating composition and the chelating agent is present in a sufficient amount to ensure that in the deposited pretreatment coating on the metal substrate the average total atomic % of copper to atomic % of zirconium is equal to or less than 1.1. The pretreatment coating composition is useful for treating a variety of metal substrates. |
申请公布号 |
US9580813(B2) |
申请公布日期 |
2017.02.28 |
申请号 |
US201615015523 |
申请日期 |
2016.02.04 |
申请人 |
Henkel AG & Co. KGaA |
发明人 |
Vonk Donald R.;Kapic Edis;Sienkowski Michael L. |
分类号 |
C23C22/34;C23C22/60;C23C22/68;C23C22/78;C23C22/83;C09D7/12;B05D1/36;B05D3/00 |
主分类号 |
C23C22/34 |
代理机构 |
|
代理人 |
Cameron Mary K. |
主权项 |
1. An article of manufacture comprising a coated metal substrate which has been coated according to a method comprising steps of:
a) contacting a metal substrate with a pre-rinse comprising a copper chelating agent, and optionally copper, prior to application of a zirconium-based pretreatment coating composition to the metal substrate; b) applying to the metal substrate a zirconium-based metal pretreatment coating composition comprising dissolved Zr, a source of fluoride, optionally materials comprising one or more of silicon, boron and yttrium and optional added dissolved Cu, thereby forming a pretreatment coating on the metal substrate; wherein the copper chelating agent is present in the pre-rinse in an amount sufficient to control the amount of copper deposited onto the metal substrate by the zirconium-based pretreatment coating composition such that an average total ratio of atomic % of Cu to atomic % of Zr in the pretreatment coating deposited on the metal substrate is in a range of 0.0001 and 1.1. |
地址 |
Duesseldorf DE |