Thin film deposition device and method of depositing thin film using thereof

摘要

A thin film deposition device and a method of depositing thin film materials are disclosed. In one aspect, the thin film deposition device includes a deposition chamber configured to accommodate a substrate and a first chamber plate placed in the deposition chamber and configured to mount the substrate on a first surface thereof. The thin film deposition device also includes a second chamber plate placed in the deposition chamber on the opposite side of the first chamber plate with reference to the substrate. A plurality of recesses are formed on a surface of the second chamber plate facing the first surface of the first chamber plate such that gas flow is formed through the respective recesses.

主权项

1. A thin film deposition device comprising:
a deposition chamber configured to accommodate a substrate therein; a first chamber plate placed in the deposition chamber and configured to mount the substrate on a first surface thereof; and a second chamber plate placed in the deposition chamber on the opposite side of the first chamber plate with reference to the substrate, wherein a plurality of recesses are formed on a surface of the second chamber plate facing the first surface of the first chamber plate such that gas flow is formed through the plurality of recesses.