发明名称 Quantum efficiency of multiple quantum wells
摘要 Improved quantum efficiency of multiple quantum wells. In accordance with an embodiment of the present invention, an article of manufacture includes a p side for supplying holes and an n side for supplying electrons. The article of manufacture also includes a plurality of quantum well periods between the p side and the n side, each of the quantum well periods includes a quantum well layer and a barrier layer, with each of the barrier layers having a barrier height. The plurality of quantum well periods include different barrier heights.
申请公布号 US9583671(B2) 申请公布日期 2017.02.28
申请号 US201514629487 申请日期 2015.02.23
申请人 Invensas Corporation 发明人 Wang Liang;Mohammed Ilyas;Beroz Masud
分类号 H01L21/00;H01L33/00;H01L33/06;H01L31/0352;H01L31/105;B82Y20/00;H01L33/32;H01L33/62;H01L29/06;H01L31/00;H01L33/24;H01S5/20;H01S5/34;H01S5/343;H01S5/32 主分类号 H01L21/00
代理机构 Forefront IP Lawgroup of Christie & Rivera, pllc 代理人 Forefront IP Lawgroup of Christie & Rivera, pllc
主权项 1. A method comprising: forming a stack of layers for a multiple quantum well semiconductor device on a substrate, said stack of layers comprising: a p type layer; an electron blocking layer in contact with said p type layer; a plurality of quantum well periods in contact with said electron blocking layer, each of said quantum well periods comprising a quantum well layer and a barrier layer that comprises a barrier layer p type doping concentration, and wherein said plurality of quantum well periods comprise barrier layers of varying p type doping concentration; an n-type layer in contact with said plurality of quantum well periods; and etching said stack of layers such that said plurality of quantum well periods comprise said quantum well layers of varying area.
地址 San Jose CA US