发明名称 Complex oxide, thin-film capacitive element, liquid droplet discharge head, and method of producing complex oxide
摘要 A complex oxide includes a chemical compound represented by ABO3 (Chemical Formula 1). In the Chemical Formula 1, A is one or more elements selected from Ba, Ca, and Sr; and B is one or more elements selected from Ti, Zr, Hf, and Sn. When a field having a size of 1 μm×1 μm on a surface of the complex oxide is observed with an atomic force microscope (AFM), a typical particle size is greater than or equal to 300 nm and less than 660 nm. Here, the typical particle size is a maximum length of a maximum particle observed in the field.
申请公布号 US9583270(B2) 申请公布日期 2017.02.28
申请号 US201414183707 申请日期 2014.02.19
申请人 Ricoh Company, Ltd. 发明人 Akiyama Yoshikazu;Chen Xianfeng
分类号 H01L41/09;H01G7/06;H01L41/08;H01L41/187;H01L41/317;B05B17/06 主分类号 H01L41/09
代理机构 IPUSA, PLLC 代理人 IPUSA, PLLC
主权项 1. A complex oxide comprising: a chemical compound represented by ABO3 (Chemical Formula 1), and a chemical compound represented by BaB2O4 (Chemical Formula 2), wherein in the Chemical Formula 1, A is one or more elements selected from Ba, Ca, and Sr; and B is one or more elements selected from Ti, Zr, Hf, and Sn, and in the Chemical Formula 2, B is one or more elements selected from Ti, Zr, Hf, and Sn, wherein the chemical compound represented by the Chemical Formula 2 is included in the chemical compound represented by the Chemical Formula 1, so that a ratio of an amount of the chemical compound represented by the Chemical Formula 2 with respect to that of the chemical compound represented by the Chemical Formula 1 is greater than or equal to 0.5 mol % and less than or equal to 3 mol %, and wherein, when a field having a size of 1 μm×1 μm on a surface of the complex oxide is observed with an atomic force microscope (AFM), a typical particle size is greater than or equal to 300 nm and less than 660 nm, wherein the typical particle size is a maximum length of a maximum particle observed in the field.
地址 Tokyo JP