发明名称 Endoscope device, and measurement method
摘要 Provided with an endoscope device configured to measure a specimen using a pattern projection image of the specimen on which a light and shade pattern of light is projected, includes: an imaging unit configured to acquire an image of the specimen; an illumination unit having a first light source configured to emit illumination light to illuminate an observation field of vision of the imaging unit; a pattern projection unit having a second light source configured to emit projection light to project the light and shade pattern on the specimen; a display unit configured to display the image acquired by the imaging unit; and a control unit configured to control the imaging unit, the illumination unit, the pattern projection unit, and the display unit.
申请公布号 US9581802(B2) 申请公布日期 2017.02.28
申请号 US201314085726 申请日期 2013.11.20
申请人 OLYMPUS CORPORATION 发明人 Yokota Masayoshi
分类号 H04N13/02;G02B23/24;G01B11/25;A61B1/00;A61B1/06;A61B5/107;A61B1/045 主分类号 H04N13/02
代理机构 Holtz, Holtz & Volek PC 代理人 Holtz, Holtz & Volek PC
主权项 1. An endoscope device configured to measure a specimen using a pattern projection image of the specimen on which a light and shade pattern of light is projected, the endoscope device comprising: an imaging unit configured to acquire an image of the specimen; an illumination unit having a first light source configured to emit illumination light to illuminate an observation field of vision of the imaging unit; a pattern projection unit having a second light source configured to emit projection light to project the light and shade pattern on the specimen; a display unit configured to display the image acquired by the imaging unit; and a control unit configured to control the imaging unit, the illumination unit, the pattern projection unit, and the display unit, wherein the control unit: varies an emission state of the illumination light from the first light source at a predetermined period, reduces emission of the projection light from the second light source in a state in which the illumination light is emitted from the first light source, emits the projection light from the second light source in a state in which emission of the illumination light from the first light source is reduced, controls the imaging unit to acquire the pattern projection image obtained by projecting the light and shade pattern on the specimen in a state in which the projection light is emitted, controls the imaging unit to acquire a first light field image obtained by illuminating the specimen with the illumination light in a state in which the illumination light is emitted before the acquisition of the pattern projection image, controls the imaging unit to acquire a second light field image obtained by illuminating the specimen with the illumination light in a state in which the illumination light is emitted after the acquisition of the pattern projection image, detects a deviation amount between the first light field image and the second light field image, determines whether or not the deviation amount is less than a predetermined threshold value, measures a 3-dimensional shape of the specimen using the pattern projection image acquired by the imaging unit only when it is determined that the deviation amount is less than the threshold value, and displays information obtained by the measurement on the display unit with one of the first light field image and the second light field image.
地址 Tokyo JP