发明名称 |
Integrated semiconductor device comprising a hall effect current sensor |
摘要 |
The semiconductor integrated device has a conductive region, for example, an external contact pad, configured to be traversed by a current to be measured. A concentrator of magnetic material partially surrounds the conductive region and has an annular shape open at a point defining an air gap area where a sensitive region is arranged, which is electrically conductive and is typically of doped semiconductor material, such as polycrystalline silicon. The device is integrated in a chip formed by a substrate and by an insulating layer, the sensitive region and the concentrator being formed in the insulating layer. |
申请公布号 |
US9581620(B2) |
申请公布日期 |
2017.02.28 |
申请号 |
US201514615196 |
申请日期 |
2015.02.05 |
申请人 |
STMicroelectronics S.r.l. |
发明人 |
Sutera Dario;Patti Davide Giuseppe;Cinnera Martino Valeria |
分类号 |
G01R15/20;G01R15/18;G01R19/00;G01R33/07 |
主分类号 |
G01R15/20 |
代理机构 |
Seed IP Law Group LLP |
代理人 |
Seed IP Law Group LLP |
主权项 |
1. An integrated semiconductor device comprising:
a semiconductor substrate; an insulating layer overlying the substrate; a conductive region configured to be traversed by a current to be measured; a concentrator of ferromagnetic material partially surrounding the conductive region, the concentrator having an annular shape open at a point defining a gap area; and a sensitive region, which is electrically conductive, arranged in the gap area, wherein the sensitive region and the concentrator are formed in the insulating layer. |
地址 |
Agrate Brianza IT |