发明名称 Integrated semiconductor device comprising a hall effect current sensor
摘要 The semiconductor integrated device has a conductive region, for example, an external contact pad, configured to be traversed by a current to be measured. A concentrator of magnetic material partially surrounds the conductive region and has an annular shape open at a point defining an air gap area where a sensitive region is arranged, which is electrically conductive and is typically of doped semiconductor material, such as polycrystalline silicon. The device is integrated in a chip formed by a substrate and by an insulating layer, the sensitive region and the concentrator being formed in the insulating layer.
申请公布号 US9581620(B2) 申请公布日期 2017.02.28
申请号 US201514615196 申请日期 2015.02.05
申请人 STMicroelectronics S.r.l. 发明人 Sutera Dario;Patti Davide Giuseppe;Cinnera Martino Valeria
分类号 G01R15/20;G01R15/18;G01R19/00;G01R33/07 主分类号 G01R15/20
代理机构 Seed IP Law Group LLP 代理人 Seed IP Law Group LLP
主权项 1. An integrated semiconductor device comprising: a semiconductor substrate; an insulating layer overlying the substrate; a conductive region configured to be traversed by a current to be measured; a concentrator of ferromagnetic material partially surrounding the conductive region, the concentrator having an annular shape open at a point defining a gap area; and a sensitive region, which is electrically conductive, arranged in the gap area, wherein the sensitive region and the concentrator are formed in the insulating layer.
地址 Agrate Brianza IT