| 发明名称 |
COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY AND PATTERN FORMING METHOD |
| 摘要 |
This underlayer film-forming composition for lithography contains a compound represented by specific formula (1) and 20 to 99 mass% of a solvent component (S), wherein the compound represented by formula (1) comprises 27 to 100 mass% of a component (A), which exists in addition to the solvent component (S). |
| 申请公布号 |
SG11201700801R(A) |
申请公布日期 |
2017.02.27 |
| 申请号 |
SG11201700801R |
申请日期 |
2015.07.31 |
| 申请人 |
MITSUBISHI GAS CHEMICAL COMPANY, INC. |
发明人 |
OKADA, KANA;MAKINOSHIMA, TAKASHI;ECHIGO, MASATOSHI;HIGASHIHARA, GO;OKOSHI, ATSUSHI |
| 分类号 |
G03F7/11;C07C261/02;G03F7/004;G03F7/26;H01L21/027 |
主分类号 |
G03F7/11 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
