METHOD FOR MANUFACTURING PATTERNED OBJECT, PATTERNED OBJECT, AND LIGHT IRRADIATION APPARATUS

摘要

Disclosed herein is a method for manufacturing a patterned object and a light irradiation apparatus that make it possible to form a pattern that accurately follows a mask pattern with higher accuracy in a patterning process of irradiating a pattern forming substrate with vacuum ultra violet light. The light irradiation apparatus includes a mask stage arranged apart from the pattern forming substrate and configured to hold a mask on which a prescribed pattern is formed, and a vacuum ultra violet light source unit configured to irradiate the pattern forming substrate with vacuum ultra violet light through the mask. A space between the mask and the pattern forming substrate is set to be an atmosphere containing oxygen. The vacuum ultra violet light source unit irradiates light, as the vacuum ultra violet light, having a continuous spectrum in a range where a wavelength ranges from 180 nm to 200 nm.

主权项

1. A method for manufacturing a patterned object, comprising:
irradiating a pattern forming substrate with light containing vacuum ultra violet light in an atmosphere containing oxygen via a mask on which a prescribed pattern is formed; and manufacturing a patterned object in which a pattern is formed including a modified portion and non-modified portion on a light irradiation surface of the pattern forming substrate, the vacuum ultra violet light being light having a continuous spectrum in a range where a wavelength ranges from 180 nm to 200 nm, and the vacuum ultra violet light has one or more peaks in the continuous spectrum.