METHOD FOR MANUFACTURING MATRIX

摘要

A method for manufacturing a matrix having an uneven pattern includes the steps of: supplying a photocuring material onto a high-refractive-index medium 130 and forming a photocuring material film 210; and radiating a plurality of luminous fluxes 330, 370, 390 at mutually different incidence directions and an incidence angle equal to or greater than a critical angle from the high-refractive-index medium 130 to a predetermined region of an interface 230 of the photocuring material film 210 with the high-refractive-index medium 130, and, through use of a multi-beam interference evanescent wave thereby generated, curing the photocuring material film 210 in the vicinity of the predetermined region. Provided is a novel method for manufacturing a matrix for forming an uneven pattern in a mold used for nanoimprinting.