发明名称 堆積パターンアレイおよびその製造方法
摘要 PROBLEM TO BE SOLVED: To stably manufacture a pattern with wide area for surface plasmon resonance.SOLUTION: A manufacturing method for a deposition pattern array 300 as an embodiment of the present invention includes: a particle temporary arrangement process of temporarily arranging a plurality of spherical particles 110 on or over a first surface 80A as one of surfaces of a substrate 80 through self-stacking operation; a heating process of reducing mutual gaps between the spherical particles by heating the spherical particles and thereby fusing mutually adjacent spherical particles temporarily arranged maintaining arrangement of the spherical particles on the substrate nearby positions 112 of mutual proximity; a process of depositing a substance M to be deposited on or over the first surface of the substrate via the gaps through the mutually fused spherical particles as a mask; and a process of removing the mutually fused spherical particles. In an embodiment of the present invention, the deposition pattern array 300 is also provided.
申请公布号 JP6083593(B2) 申请公布日期 2017.02.22
申请号 JP20120200228 申请日期 2012.09.12
申请人 国立研究開発法人理化学研究所 发明人 田口 敦清;河田 聡;齊藤 結花
分类号 G01N21/64 主分类号 G01N21/64
代理机构 代理人
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