发明名称 |
Pump system, a carbon dioxide supply system, an extraction system, a lithographic apparatus and a device manufacturing method |
摘要 |
An extraction system, including a pump to pump gas along a conduit to a check valve configured to open at an upstream pressure over a certain magnitude, a pressure sensor to generate a signal indicative of a pressure of gas between the pump and the check valve, and a controller configured to generate a stop signal if a signal from the pressure sensor indicates that the pressure of gas between the pump and the check valve is below a certain magnitude. |
申请公布号 |
US9575406(B2) |
申请公布日期 |
2017.02.21 |
申请号 |
US201213714205 |
申请日期 |
2012.12.13 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
Van Der Gaag Marc Léon;Van Den Heuvel Leonarda Hendrika;Martens Arjan Hubrecht Josef Anna;Van Boxtel Frank Johannes Jacobus |
分类号 |
G03B27/52;G03B27/42;G03F7/00;G03F7/20 |
主分类号 |
G03B27/52 |
代理机构 |
Pillsbury Winthrop Shaw Pittman LLP |
代理人 |
Pillsbury Winthrop Shaw Pittman LLP |
主权项 |
1. A lithographic apparatus comprising:
a carbon dioxide supply system to provide carbon dioxide from a source to a first gas outlet; a fluid handling system to provide a liquid to a space between a final element of a projection system and a facing surface and having the first gas outlet to supply a gas flow radially outward of a meniscus of liquid in the space; a second gas outlet radially outward of the first gas outlet to supply a flow of temperature conditioned gas, separate from the carbon dioxide supply, onto an object; and a control system comprising a sensor to detect flow and/or pressure at or upstream of the second gas outlet, the control system configured to stop the supply of the gas flow radially outward of the meniscus of liquid if a signal from the sensor indicates that flow and/or pressure at or upstream of the second gas outlet is below a certain magnitude. |
地址 |
Veldhoven NL |