发明名称 Pump system, a carbon dioxide supply system, an extraction system, a lithographic apparatus and a device manufacturing method
摘要 An extraction system, including a pump to pump gas along a conduit to a check valve configured to open at an upstream pressure over a certain magnitude, a pressure sensor to generate a signal indicative of a pressure of gas between the pump and the check valve, and a controller configured to generate a stop signal if a signal from the pressure sensor indicates that the pressure of gas between the pump and the check valve is below a certain magnitude.
申请公布号 US9575406(B2) 申请公布日期 2017.02.21
申请号 US201213714205 申请日期 2012.12.13
申请人 ASML NETHERLANDS B.V. 发明人 Van Der Gaag Marc Léon;Van Den Heuvel Leonarda Hendrika;Martens Arjan Hubrecht Josef Anna;Van Boxtel Frank Johannes Jacobus
分类号 G03B27/52;G03B27/42;G03F7/00;G03F7/20 主分类号 G03B27/52
代理机构 Pillsbury Winthrop Shaw Pittman LLP 代理人 Pillsbury Winthrop Shaw Pittman LLP
主权项 1. A lithographic apparatus comprising: a carbon dioxide supply system to provide carbon dioxide from a source to a first gas outlet; a fluid handling system to provide a liquid to a space between a final element of a projection system and a facing surface and having the first gas outlet to supply a gas flow radially outward of a meniscus of liquid in the space; a second gas outlet radially outward of the first gas outlet to supply a flow of temperature conditioned gas, separate from the carbon dioxide supply, onto an object; and a control system comprising a sensor to detect flow and/or pressure at or upstream of the second gas outlet, the control system configured to stop the supply of the gas flow radially outward of the meniscus of liquid if a signal from the sensor indicates that flow and/or pressure at or upstream of the second gas outlet is below a certain magnitude.
地址 Veldhoven NL