发明名称 Ion Milling Apparatus and Sample Processing Method
摘要 Provided is a technology for suppressing a heat rise in a sample, the heat rise being generated due to ion beam irradiation at a low acceleration voltage. A blocking plate, which is different from a mask, is disposed in front of a sample. The blocking plate has an opening that overlaps a processing surface, and ion beams pass only through the opening of the blocking plate, and in the areas excluding the opening, the ion beams are blocked by the blocking plate, and the sample is not irradiated thereby. Furthermore, the heat rise in the sample is further suppressed by cooling the blocking plate.
申请公布号 US2017047198(A1) 申请公布日期 2017.02.16
申请号 US201415306510 申请日期 2014.05.09
申请人 Hitachi High-Technologies Corporation 发明人 HORINOUCHI Kento;KAMINO Atsushi;IWAYA Toru;TAKASU Hisayuki
分类号 H01J37/305;H01J37/20;G01N1/32 主分类号 H01J37/305
代理机构 代理人
主权项 1. An ion milling apparatus to irradiate a sample with an ion beam and to thereby perform milling of the sample, the ion milling apparatus comprising: an ion source to emit the ion beam; a sample holder to fix the sample by placing the sample thereon; a sample mask to cover the sample and to allow only a part of the sample to be exposed as a target of milling; and a beam irradiation area limiting member, disposed between the sample mask and the ion source, to limit an irradiation area of the sample with the ion beam.
地址 Minato-ku, Tokyo JP