发明名称 |
Cleaning Apparatus and Associated Low Pressure Chamber Apparatus |
摘要 |
Disclosed is a cleaning apparatus configured to clean a radiation transmission assembly (such as a viewport), or part thereof. The radiation transmission assembly provides for radiation transmission to and/or from a low pressure chamber. The cleaning apparatus comprises, a hydrogen radical generator configured to generate hydrogen radicals for use in cleaning said radiation transmission assembly or part thereof, and a connection assembly for connection to said radiation transmission assembly. |
申请公布号 |
US2017045832(A1) |
申请公布日期 |
2017.02.16 |
申请号 |
US201515303604 |
申请日期 |
2015.04.09 |
申请人 |
ASML Netherlands B.V. |
发明人 |
MOLKENBOER Freek Theodorus;BURKE Jeremy;CLAUSSEN Wilhelm;DEUTZ Alexander Franciscus;HODO Jerry Don;HULSBOSCH-DAM Cornelia Elizabeth Carolina;TE SLIGTE Edwin;VAN DEN HURK Mayk |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
1. A cleaning apparatus configured to clean a radiation transmission assembly or part thereof, said radiation transmission assembly providing for radiation transmission to and/or from a low pressure chamber environment, said cleaning apparatus comprising:
a hydrogen radical generator configured to generate hydrogen radicals for use in cleaning said radiation transmission assembly or part thereof; and a connection assembly for connection of the hydrogen radical generator to said radiation transmission assembly. |
地址 |
Veldhoven NL |