发明名称 Cleaning Apparatus and Associated Low Pressure Chamber Apparatus
摘要 Disclosed is a cleaning apparatus configured to clean a radiation transmission assembly (such as a viewport), or part thereof. The radiation transmission assembly provides for radiation transmission to and/or from a low pressure chamber. The cleaning apparatus comprises, a hydrogen radical generator configured to generate hydrogen radicals for use in cleaning said radiation transmission assembly or part thereof, and a connection assembly for connection to said radiation transmission assembly.
申请公布号 US2017045832(A1) 申请公布日期 2017.02.16
申请号 US201515303604 申请日期 2015.04.09
申请人 ASML Netherlands B.V. 发明人 MOLKENBOER Freek Theodorus;BURKE Jeremy;CLAUSSEN Wilhelm;DEUTZ Alexander Franciscus;HODO Jerry Don;HULSBOSCH-DAM Cornelia Elizabeth Carolina;TE SLIGTE Edwin;VAN DEN HURK Mayk
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
主权项 1. A cleaning apparatus configured to clean a radiation transmission assembly or part thereof, said radiation transmission assembly providing for radiation transmission to and/or from a low pressure chamber environment, said cleaning apparatus comprising: a hydrogen radical generator configured to generate hydrogen radicals for use in cleaning said radiation transmission assembly or part thereof; and a connection assembly for connection of the hydrogen radical generator to said radiation transmission assembly.
地址 Veldhoven NL